Microstructure and Phase Structure of Titanium Dioxide Films Prepared by Screen-Printing Technique
Abstract
This paper deals with the characterization of titanium dioxide, TiO₂ film which was deposited on and twice on ITO covered-glass substrate by screen-printing technique. The films were deposited once and twice on the substrate and then annealed at temperature of 300°C, 350°C and 400°C. The films were characterized by the techniques of x-ray diffraction (XRD), energy dispersive analysis by x-rays (EDX) and scanning electron microscopy (SEM). The results are presented in this paper.
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